Among the important parameters in optical lithography is the spatial resolution you can get and the time you need to draw your pattern. Systems with regular and fixed patterns can be extremely fast but those systems are based on masks. Mask production is a time consuming and expensive process. So-called mask-less systems can draw unorganized patterns directly on substrates, at the cost of longer process times. Researchers now have presented a new lithographic approach with a high-resolution, low-cost technique based on nanosphere lithography.
Combining scanning probe technologies with microbeads for low-cost, high-resolution optical lithography systems